ITO Conductive Glass For Laboratory Use 7/10/15/17ohm/sq  Thickness 1.1mm Customizable
ITO Conductive Glass For Laboratory Use 7/10/15/17ohm/sq  Thickness 1.1mm Customizable
ITO Conductive Glass For Laboratory Use 7/10/15/17ohm/sq  Thickness 1.1mm Customizable
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ITO Conductive Glass For Laboratory Use 7/10/15/17ohm/sq Thickness 1.1mm Customizable

Company Overview

Hitech Glass leverages the booming development of domestic panel display and solar optoelectronic industries, collaborating with universities and research institutes to drive technological innovation. We delivering full-chain solutions from substrate manufacturing to precision processing and specialize in OLED-spec ITO conductive substrates, Mo Al Mo metal substrates, and comprehensive services including coating, lithography, and packaging solutions.

Core Products & Services

1. Optoelectronic Glass Products

· Display Substrates: OLED-specific ITO conductive substrates and MoAlMo metal substrates for precise components like gate electrodes and pixel electrodes.

· Packaging & Lithography Components: Grooved covers and exposed pattern etching products for OLED packaging and circuit patterning.

· Functional Coated Materials: ITO, Ti, Al, Mo, and other metal/oxide coated substrates for conductive and optical applications.

ITO Conductive Glass For Laboratory Use 7/10/15/17ohm/sq  Thickness 1.1mm Customizable

2. Full-Process Services

· Coating Technology: PVD magnetron sputtering (Ar ion sputtering) to deposit Mo, Al, ITO films for electrode formation.

· Lithography Processes: Yellow photolithography etching, PR coating/development, UV exposure (8μm precision), with Nikon lithography machines achieving ±1μm alignment.

· Precision Processing: Wet etching (mixed acid spraying/soaking), polishing (ITO substrate Ra ≤0.6nm), and packaging cover grooving.

ITO Conductive Glass For Laboratory Use 7/10/15/17ohm/sq  Thickness 1.1mm Customizable

3. Customization Model

· Free sample testing + technical support, with customizable specifications and sizes.

· One-stop solutions from substrate cleaning (EUV for organics + Brush for particles) to final cutting.

Technological Capabilities & Equipment

1. Key Processes & Parameters


Process

Technical Highlights

Capacity

PVD Sputtering

ULVAC equipment (70%+ market share), film uniformity ≤4% (ITO), roughness Ra 0.4~0.6nm

ITO: 15K/month, Metal: 20K/month

Lithography & Etching

Nikon lithography (Class 1000 clean room), ±1μm auto-alignment, wet etching for ITO/metal

60K sheets/month

Packaging Cover Machining

Domestic etching machines, groove depth 0.1~0.7mm (±0.05mm tolerance), HF acid etching

>10,000 large sheets/month

ITO Conductive Glass For Laboratory Use 7/10/15/17ohm/sq  Thickness 1.1mm Customizable


2. Equipment Advantages

· ULVAC Magnetron Sputter Coater: Processes 650*500mm substrates (0.4~1.8mm thickness), capacity >30,000 sheets/month.

· Yongchuang Precision Grinder: 400*500mm polishing, post-grinding ITO Ra as low as 0.396nm .

· Bando Cutting & Edging Machine: Max cutting size 1400*1600mm, capacity >50,000 sheets/month.

Contact & Conversion

For free sample testing or customized solutions, contact Hitech Glass - leveraging ULVAC coating equipment and Nikon lithography technology to deliver high-precision optoelectronic glass deep processing from substrate to finished product.

 

 


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